C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/268, 260/550
C07C 237/40 (2006.01) A61K 31/165 (2006.01)
Patent
CA 1244050
ABSTRACT OF THE DISCLOSURE The invention relates to compounds of the general formula II Image (II) , wherein at least one of the radicals R4 and R5 represents a methyl radical, and the other radicals R4 to R6, which can be the same or different, are a hydrogen atom or a methyl radical, as well as the pharmacologically acceptable salts thereof with inorganic or organic acids. The compounds are useful for controlling malignant prolifera- tive and autoimmune diseases and for immunosuppressive therapy with trans- plants. Compounds in which one or both of R4 and R5 are methyl radicals are novel.
447732
Fritschi Edgar
Herrmann Manfred
Satzinger Gerhard
Weiershausen Ute
Godecke Aktiengesellschaft
Smart & Biggar
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