C - Chemistry – Metallurgy – 08 – B
Patent
C - Chemistry, Metallurgy
08
B
C08B 37/08 (2006.01) A61K 8/73 (2006.01) A61K 47/36 (2006.01) A61K 47/48 (2006.01) C08J 5/18 (2006.01) C08L 5/08 (2006.01) C09K 3/00 (2006.01) A61K 7/48 (1990.01) A61K 31/73 (1990.01)
Patent
CA 2092513
FL/6-19038/A N-Substituted chitosan derivatives, process for their preparation and the use thereof Abstract of the Disclosure Chitosan derivatives having structural units of formula I, II and III in random distribution Image Image Image (I) (II) (III), wherein the substituents R1 are each independently of one another H or the radical -Z-R2-X, R3 is H or acetyl, Y is the anion O-Z-R2-X, and (a) Z is -CO- or -SO2-, X is -CO2H, -CH2CO2H or -CH2PO(OH)2, and R2 is -CHR4CR5(OH)-, R4 is -H, -OH, C1-C4alkoxy or C1-C4alkyl, and R5 is H or C1-C4alkyl, or (b) Z is -CO-, X is -CO2H, and R2 is -CHR6-CHR7-CH(OH)- or -CHR8-CHR9-CHR10-CH(OH)-, R6, R7, R8 and R10 are each independently of one another -H, -OH, C1-C4alkyl or C1-C4alkoxy, and R9 is -H, -OH, C1-C4alkyl, C1-C4alkoxy or -CO2H, and the esters and salts thereof, which chitosan derivative contains a total of at least 2 structural units and, based on 1 mol of the chitosan derivative, 30 to 100 % molar of structural units of formula I, 60 to 0 % molar of structural units of formula II, and 30 to 0 % molar of structural units of formula III, and the sum of the molar percentages is 100 %. These derivatives are suitable for use as humectants and for the prevention of the adherence to and/or formation of solid deposits on inorganic or organic substrates.
Lohmann Dieter
Randell Donald R.
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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