C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 277/34 (2006.01) A61K 31/425 (2006.01) A61K 31/44 (2006.01) C07C 253/00 (2006.01) C07C 253/30 (2006.01) C07C 255/41 (2006.01) C07D 417/12 (2006.01) C07D 491/056 (2006.01)
Patent
CA 2239245
Novel N-substituted dioxothiazolidylbenzamide derivatives having an improved insulin resistance and potent hypoglycemic and hypolipidemic effects and represented by general formula (1), wherein R1 and R2 may be the same or different and each represents hydrogen, C1-4 alkyl, C1-3 haloalkyl. C1-3 haloalkoxy, halogeno, or hydroxy, or R1 and R2 are bonded to each other to thereby form methylenedioxy; R3 represents hydrogen, C1-3 alkoxy, hydroxy, or halogeno; R4 represents hydrogen or C1-3 alkyl; n represents an integer of 0 to 2; and X represents N or CH. (57) Summary The invention provides novel N-substituted dioxothiazolidylbenzamide derivatives having an improved insulin resistance and potent hypoglycemic and hypolipidemic effects and represented by general formula (1) (see formula) [wherein R1 and R2 may be the same or different and each represents hydrogen, C1-4 alkyl, C1-3 haloalkyl, C1-3 haloalkoxy, halogeno, or hydroxy, or R1 and R2 are bonded to each other to thereby form methylenedioxy; R3 represents hydrogen, C1-3 alkoxy, hydroxy, or halogeno; R4 represents hydrogen or C1-3 alkyl; n represents an integer of 0 to 2; and X represents N or CH].
L'invention porte sur des dérivés de la dioxothiazolidylbenzamide substitués en N de formule générale (1) présentant une résistance améliorée à l'insuline et de puissants effets hypoglycémiques et hypolipidémiques. Dans la formule (1): R<1> et R<2> qui peuvent être identiques ou différents représentent H, alkyle C1-4, alkoxy C1-3, haloalkyle C1-3, haloalkoxy C1-3, halogéno, ou hydroxy, ou bien se lier l'un à l'autre pour former méthylènedioxy; R<3> représente H, alkoxy C1-3, hydroxy, ou halogéno; R<3> représente H, ou alkyle C1-3, n représente un entier de 0 à 2; et X représente N ou CH.
Awano Katsuya
Kinoshita Susumu
Maeda Toshio
Murakami Koji
Nomura Masahiro
Borden Ladner Gervais Llp
Kyorin Pharmaceutical Co. Ltd.
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