N-substituted imides and bis-imides

Details N-substituted imides and bis-imides N-substituted imides and bis-imides

C - Chemistry, Metallurgy

07

D

260/316, 260/266

C07D 207/452 (2006.01) C07D 207/448 (2006.01) C07D 241/08 (2006.01) C07D 487/04 (2006.01) C07D 491/12 (2006.01) C07D 491/14 (2006.01) C07F 7/18 (2006.01)

Patent

CA 1138458

Abstract Compounds of the formulae I or II Image or Image (I) (II) and processes for their preparation are described. In the above formulae, Z is a tetravalent aliphatic radical, which can be interrupted by one or more N-atoms, or a substituted or unsubstituted tetravalent cycloaliphatic radical, which can contain O-atoms and/or can be fused to a benzene ring, A is -C(R4)=C(R5)(R6) or -C?C-R5, especially -CH=CH2, R1 and R2 independently of one another are H, methyl, phenyl, -CN or Cl, or together are trimethylene, tetramethylene, Image , Image or Image R3 is a direct bond, C1-8 alkylene, cyclohexylene, phenyl- ene or -CH2-phenylene with the -CH2 group bonded to the N atom, R4 and R6 independently of one another are H, methyl or ethyl and R5 is H or C1-9 alkyl. The compounds of the formula I and II are valuable intermediates for the prepa- ration of silicon-modified adhesion promoters.

334535

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