N-type conductive aluminum nitride semiconductor crystal and...

C - Chemistry – Metallurgy – 30 – B

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C30B 29/38 (2006.01) C23C 16/01 (2006.01) C23C 16/34 (2006.01) C30B 25/18 (2006.01) H01L 21/205 (2006.01) H01L 33/00 (2006.01)

Patent

CA 2677414

After forming an AlN crystal layer on a single crystal substrate such as a sapphire substrate by HVPE, the substrate temperature is raised to 1,200~C or higher and a layer composed of an n-type conductive aluminum nitride semiconductor crystal is rapidly formed thereon by HVPE, thereby obtaining a laminate. The n-type conductive aluminum nitride semiconductor crystal layer contains from 1 ~ 1018 to 5 ~ 1020 cm-3 of Siatoms, while containing substantially no halogen atoms, and does not substantially absorb light having an energy of not more than 5.9 eV. Then, the n-type conductive aluminum nitride semiconductor crystal layer is separated from the thus-obtained laminate, thereby obtaining a self-supporting substrate. Consequently, there is produced a self-supporting substrate composed of an n-type conductive aluminum nitride semiconductor crystal, which is useful for manufacturing a vertical conduction AlN semiconductor device.

Après avoir formé une couche de cristal d'AlN sur un substrat de monocristal tel qu'un substrat de saphir par HVPE, la température de substrat est élevée à 1200°C ou plus et une couche composée d'un cristal semi-conducteur de nitrure d'aluminium conducteur de type n est rapidement formé sur celui-ci par HVPE, permettant ainsi d'obtenir un stratifié. La couche de cristal semi-conducteur de nitrure d'aluminium conducteur de type n contient de 1 x 1018 à 5 x 1020 cm-3 d'atomes de Si, tout en ne contenant sensiblement pas d'atomes d'halogène, et elle n'absorbe sensiblement pas de lumière d'une énergie égale ou supérieure à 5,9 eV. Ensuite, la couche de cristal semi-conducteur de nitrure d'aluminium conducteur de type n est séparée du stratifié ainsi obtenu, permettant ainsi d'obtenir un substrat autosupporté. En conséquence, on obtient un substrat autosupporté composé d'un cristal semi-conducteur de nitrure d'aluminium conducteur de type n, utile pour fabriquer un dispositif semi-conducteur AlN de conduction verticale.

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