Nanocrystal electron device

H - Electricity – 01 – L

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Details

H01L 29/06 (2006.01) G11C 11/40 (2006.01) H01L 21/28 (2006.01) H01L 29/423 (2006.01) H01L 29/788 (2006.01) H03F 3/16 (2006.01)

Patent

CA 2496032

A MOS transistor (29) having utility as a charge storage device, as in a nonvolatile memory device, or as an amplifier, using the charge storage feature of the device as a way to modulate the conductivity of a channel between source and drain electrodes (31, 33). Over a doped substrate (11), a gate oxide layer (17) isolates a doped, electrically isolated, charge reservoir layer (19) from the substrate. An overlying tunnel barrier layer (21) isolates the charge reservoir layer from a nanocrystal layer (23) capable of receiving or dispensing electric charge to the charge reservoir layer under the influence of a control gate (27) overlying the nanocrystal layer and separated by an oxide layer (25). Electric charge on the charge reservoir layer influences the conductivity of the channel. The device may be operated in a memory mode, like an EEPROM, or in an amplifier mode where changes in the gate voltage are reflected in conductivity changes of the channel.

L'invention concerne un transistor MOS (29) servant de dispositif de stockage de charge, notamment dans un dispositif de mémoire non volatile, ou en tant qu'amplificateur, utilisant la caractéristique de stockage de charge du dispositif comme une façon de moduler la conductivité d'un canal entre les électrodes source et drain (31, 33). Par dessus un substrat dopé (11), une couche d'oxyde de grille (17) isole du substrat une couche réservoir de charge (19) dopée, électriquement isolée. Une couche barrière tunnel recouvrante (21) isole la couche réservoir de charge d'une couche de nanocristaux (23) pouvant recevoir une charge électrique de la couche réservoir de charge, ou lui distribuer, sous l'influence d'une grille de commande (27) recouvrant la couche de nanocristaux et séparée par une couche d'oxyde (25). La charge électrique sur la couche réservoir de charge influence la conductivité du canal. Le dispositif peut fonctionner en mode mémoire, comme une EEPROM, ou en mode d'amplification où les changements dans la tension de grille sont reflétés dans des changements de conductivité du canal.

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