Nanofabrication

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B - Operations, Transporting

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B

B82B 1/00 (2006.01) B82B 3/00 (2006.01) G03F 7/16 (2006.01) G11C 11/00 (2006.01) H01J 1/304 (2006.01) H01L 29/15 (2006.01) H01L 35/00 (2006.01) H01L 35/32 (2006.01)

Patent

CA 2451882

Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi- scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.

L'invention concerne des moyens de fabrication rapides et fiables de nanostructures tridimensionnelles. L'invention concerne plus particulièrement des procédés simples de production de nanostructures multiniveau bien ordonnées. Ces procédés consistent à structurer des modèles de copolymères séquencés en les exposant de façon sélective à une source de rayonnement. Le modèle lithographique multi-échelle ainsi obtenu peut être traité dans des étapes de post-fabrication pour produire des supports, des dispositifs et des systèmes nanométriques intégrés, tridimensionnels, multiniveau.

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