C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
C09K 3/14 (2006.01) C09G 1/02 (2006.01) H01L 21/321 (2006.01)
Patent
CA 2382724
CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
L'invention concerne des procédés et des produits de planarisation mécanico-chimique qui utilisent des particules d'alpha-alumine ayant une largeur de particule inférieure à 50 nanomètres et une surface d'au moins 50 m2/g.
Delaney William R.
Garg Ajay K.
Tanikella Brahmanandam V.
Gowling Lafleur Henderson Llp
Saint-Gobain Ceramics & Plastics Inc.
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