C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/289, 260/314
C07C 59/66 (2006.01) C07D 215/14 (2006.01) C07D 277/00 (2006.01)
Patent
CA 1331000
Abstract of the Disclosure There are disclosed compounds of the formula Image wherein A is alkyl of 3-19 carbon atoms, diloweralkylvinyl, dihalovinyl, diphenylvinyl, lower alkynyl, Image or Image ; X is N or CR; Z is Image , Image , Image , Image , -S- or -O-; R is hydrogen or lower alkyl; R1 is hydrogen, lower alkyl or phenyl; R2 is hydrogen or loweralkyl; or R1 and R2 taken together form a benzene ring; and the pharmaceutically acceptable salts thereof, and their use in the treatment of leukotriene-mediated naso-bronchial obstructive airpassageway conditions, such as allergic rhinitis, allergic bronchial asthma and the like, in psoriasis, ulcerative colitis, rheumatoid arthritis as well as in other immediate hypersensitivity reactions.
574353
Bicksler James J.
Giberson John W.
Kreft Anthony F. III
Kubrak Dennis M.
Musser John H.
American Home Products Corporation
Ridout & Maybee Llp
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