C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/235, 260/304
C07D 263/38 (2006.01) A61K 31/42 (2006.01) C07C 217/94 (2006.01) C07D 263/20 (2006.01) C07D 263/24 (2006.01) C07D 413/12 (2006.01)
Patent
CA 2028440
A naphthyloxazolidone derivative of the formula: Image wherein R1 is hydrogen atom, hydroxy group, nitro group, amino group, sulfo group, aminosulfonyl group, a lower alkenyloxy group, a lower alkynyloxy group, a mono or di(lower alkyl)aminocarbonyloxy group, a lower alkanoyloxy group or a lower alkoxy group which may have a substituent selected from an aryl group, a cycloalkyl group, an oxygen- containing heteromonocyclic group, hydroxy group, a lower alkoxy group, cyano group, a di(lower alkyl)amino group, aminocarbonyl group, a lower alkoxycarbonyl group, a lower alkanoyloxy group, a lower alkylthio group, a lower alkylsulfinyl group and a lower alkylsulfonyl group; R2 is hydroxy group, a lower alkoxy group, a lower alkylsulfonyloxy group, triazo group or an amino group which may have a substituent selected from a lower alkyl group and a lower alkanoyl group, and a pharmaceutically acceptable salt thereof are disclosed. Said derivative and a pharmaceutically acceptable salt thereof are useful as an antidepressant.
Iwata Hiroshi
Matsumoto Mamoru
Nakai Hideo
Nomura Sumihiro
Yamada Koichiro
Marks & Clerk
Tanabe Seiyaku Co. Ltd.
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