Narrow band excimer laser and wavelength detecting apparatus

H - Electricity – 01 – S

Patent

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H01S 3/00 (2006.01) G01J 9/02 (2006.01) G03F 7/20 (2006.01) H01S 3/08 (2006.01) H01S 3/1055 (2006.01) H01S 3/139 (2006.01) H01S 3/225 (2006.01)

Patent

CA 2063600

ABSTRACT OF THE DISCLOSURE A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manu- facturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direc- tion of the prism expander and the laser beam axis. An anti-reflection film which selectively prevents reflection of a polarized light component substantially parallel to the direction of beam expanding of a prism beam expander is coated on one surface of a prism that constitutes the prism beam expander. The wavelength detecting apparatus is con- structed to input a reference light and a light to be de- tected upon the etalon. The light transmitting through the etalon is condensed to focus on a light detector for detect- ing the wavelength of the laser beam based on interference fringe detected by the light detector.

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