H - Electricity – 01 – S
Patent
H - Electricity
01
S
H01S 3/00 (2006.01) G01J 9/02 (2006.01) G03F 7/20 (2006.01) H01S 3/08 (2006.01) H01S 3/1055 (2006.01) H01S 3/139 (2006.01) H01S 3/225 (2006.01)
Patent
CA 2063600
ABSTRACT OF THE DISCLOSURE A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manu- facturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direc- tion of the prism expander and the laser beam axis. An anti-reflection film which selectively prevents reflection of a polarized light component substantially parallel to the direction of beam expanding of a prism beam expander is coated on one surface of a prism that constitutes the prism beam expander. The wavelength detecting apparatus is con- structed to input a reference light and a light to be de- tected upon the etalon. The light transmitting through the etalon is condensed to focus on a light detector for detect- ing the wavelength of the laser beam based on interference fringe detected by the light detector.
Kobayashi Yukio
Kowaka Masahiko
Wakabayashi Osamu
Kabushiki Kaisha Komatsu Seisakusho
Kobayashi Yukio
Kowaka Masahiko
Macera John Stephen
Wakabayashi Osamu
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