Negative ion extractor

Details Negative ion extractor Negative ion extractor

H - Electricity

01

J

204/96.05

H01J 27/14 (2006.01) H01J 37/08 (2006.01) H01J 37/305 (2006.01)

Patent

CA 1111801

NEGATIVE ION EXTRACTOR Abstract of the Disclosure Process and apparatus for use in extracting negative ions from a plasma which is particularly useful in reactive ion etching of metals, silicon and oxides and nitrides of silicon in the manufacture of semiconductor devices. A magnetic field is employed in the apparatus and, herein, is created by a novel grid, through which negative ions pass to a surface, such as one to be etched, while free electrons are prevented from passing through the grid and out of the plasma. The novel process utilizes negative ions which have a large fraction in the atomic state.

311728

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