Negative photoresist and a process therefor

Details Negative photoresist and a process therefor Negative photoresist and a process therefor

G - Physics

03

F

G03F 7/038 (2006.01) G03F 7/012 (2006.01)

Patent

CA 2106231

ABSTRACT A negative photoresist and a process for the preparation thereof. However, the negative photoresist used developers normally employed for positive photoresists. The photoresist comprises a photoactive compound, a novolac resin and a solvent. The novolac resin is subjected to the step of purification prior to it being used in the photoresist.

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