Negative photoresist based on polyphenols and epoxy...

Details Negative photoresist based on polyphenols and epoxy... Negative photoresist based on polyphenols and epoxy...

G - Physics

03

F

96/219, 400/5906

G03F 7/038 (2006.01) H04N 5/232 (2006.01) A61K 38/00 (2006.01)

Patent

CA 1306568

3-16036/+ Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers Abstract The present invention relates to a negative photo- resist consisting essentially of a) at least one solid film-forming polyphenol, b) at least one compound which contains at least two epoxide groups or at least two vinyl ether groups or at least one epoxide and vinyl ether group in the molecule, c) at least one cationic photoinitiator for component b) and d) if appropriate customary additives. The resist can be developed under aqueous-alkaline conditions.

543845

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