Negative photoresist composition

Details Negative photoresist composition Negative photoresist composition

G - Physics

03

F

G03F 7/038 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2060228

- 33 - ABSTRACT OF THE DISCLOSURE A negative photoresist composition containing an alkali-soluble resin which is obtainable through a conden- sation reaction of an aldehyde with a phenol compound con- taining a compound of the general formula: Image (1) wherein R1 to R9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R1 to R9 is a hydroxyl group and, at the ortho- or para- position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo- acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.

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