G - Physics – 03 – C
Patent
G - Physics
03
C
96/172, 96/219
G03C 5/06 (2006.01) C08L 79/04 (2006.01) G03F 7/008 (2006.01) G03F 7/038 (2006.01)
Patent
CA 1272059
PATENT APPLICATION OF PALAIYUR S. KALYANARAMAN for NEGATIVE PHOTORESIST SYSTEMS DN 82-57 MSA:plb Abstract of the Invention This invention relates to negative photoresist systems containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.
471302
Gowling Lafleur Henderson Llp
Rohm And Haas Company
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