Negative resist compositions

Details Negative resist compositions Negative resist compositions

G - Physics

03

F

96/150

G03F 7/038 (2006.01) G03F 7/029 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1325353

Abstract of the Invention NEGATIVE RESIST COMPOSITIONS Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light x-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.

557770

Affiliated with

Also associated with

Rating

Negative resist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative resist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative resist compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1236707