G - Physics – 03 – F
Patent
G - Physics
03
F
101/119, 96/189
G03F 7/021 (2006.01) B41N 1/14 (2006.01) G03F 7/095 (2006.01) G03F 7/016 (2006.01)
Patent
CA 2040199
ABSTRACT OF THE DISCLOSURE A negative-type photosensitive lithographic printing plate having a photosensitive layer comprising upper and lower layers, each layer containing a photosensitive diazo resin, on a support having a hydrophilic surface. The concentration of the diazo resin in the upper layer is not more than 1/3 of the concentration of the diazo resin in the lower layer, the thickness of the upper layer is not less than three times the thickness of the lower layer, and the upper layer contains an oleophilic non-photosensitive resin with a weight average molecular weight ranging from 10,000 to 150,000. The lithographic printing plate has a very short exposure time, may be used with projection exposure systems and allows for the use of known developers and automated developer systems. TRS/kim
Fetherstonhaugh & Co.
Mitsubishi Chemical Corporation
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