Negative working light-sensitive lithographic plate...

Details Negative working light-sensitive lithographic plate... Negative working light-sensitive lithographic plate...

G - Physics

03

F

96/200

G03F 7/016 (2006.01) G03F 7/022 (2006.01) G03F 7/075 (2006.01)

Patent

CA 1277170

ABSTRACT OF THE DISCLOSURE A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working lihgt-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.

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