Negative-working, non-swelling resist

G - Physics – 03 – F

Patent

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G03F 7/26 (2006.01) G03F 7/004 (2006.01) G03F 7/031 (2006.01)

Patent

CA 1254431

-0- NEGATIVE-WORKING, NON-SWELLING RESIST Abstract There are disclosed negative-working resist compositions featuring a binder and a radiation- sensitive compound that loses HX upon exposure, to become less soluble in an aqueous base. X is selected from the group consisting of -CN, halide, and -SO2R1, and R1 is alkyl of 1-5 carbon atoms or aryl of from 6 to 10 carbon ring atoms.

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