G - Physics – 03 – F
Patent
G - Physics
03
F
96/150
G03F 7/26 (2006.01) G03F 7/004 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1254431
-0- NEGATIVE-WORKING, NON-SWELLING RESIST Abstract There are disclosed negative-working resist compositions featuring a binder and a radiation- sensitive compound that loses HX upon exposure, to become less soluble in an aqueous base. X is selected from the group consisting of -CN, halide, and -SO2R1, and R1 is alkyl of 1-5 carbon atoms or aryl of from 6 to 10 carbon ring atoms.
486602
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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