Negative working photoresists responsive to longer...

Details Negative working photoresists responsive to longer... Negative working photoresists responsive to longer...

G - Physics

03

C

96/150

G03C 1/72 (2006.01) G03F 7/008 (2006.01) G03F 7/028 (2006.01) G03F 7/031 (2006.01)

Patent

CA 1329041

NEGATIVE WORKING PHOTORESISTS RESPONSIVE TO LONGER WAVELENGTHS AND NOVEL COATED ARTICLES Abstract of the Disclosure A negative working photoresist is disclosed responsive to imaging radiation of a wavelength longer than 550 nm comprised of an organic film form- ing component containing ethylenic unsaturation and capable of selective immobilization by addition at the site of ethylenic unsaturation and activator and photosensitizer coinitiators for ethylenic addition. The activator is an azinium salt activator, and the photosensitizer is a dye having its principal absorp- tion peak at a wavelength longer than 550 nm and hav- ing a reduction potential which in relation to that of said azinium salt activator is at most 0.1 volt more positive.

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