Negative-working polymers useful as electron beam resists

Details Negative-working polymers useful as electron beam resists Negative-working polymers useful as electron beam resists

C - Chemistry, Metallurgy

08

F

96/264, 402/451

C08F 220/00 (2006.01) C08F 220/18 (2006.01) C08F 220/40 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1161192

Abstract . Novel acrylate copolymer material function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.

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