Negative-working radiation-sensitive mixture and...

Details Negative-working radiation-sensitive mixture and... Negative-working radiation-sensitive mixture and...

G - Physics

03

F

G03F 7/038 (2006.01) C04B 41/50 (2006.01) G03F 7/029 (2006.01)

Patent

CA 2074791

Abstract of the Disclosure A negative-working radiation-sensitive mixture containing a) a compound which contains at least one -CBr3 group bound to an atom not linked in turn to a hydrogen atom, b) an alkoxymethylated melamine and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups, wherein (1) the mixture has an absorption of < 0.4 µm-1 at 248 nm, (2) the CBr3 group of the compound a) is bound to the sulfur atom of a sulfonyl group and the compound a) is contained in the mixture in an amount of 0.2 to 10% by weight, based on the total amount of the components b) and c), (3) the ratio by mass of the components b) and c) is between 50 : 50 and 5 : 95 and (4) the component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, the homo- polymer or copolymer having a removal rate of 200 to 3,000 nm/min at 21°C in an aqueous alkaline developer containing 2.38% by weight of tetramethylammonium hydroxide, has excellent properties including high resistance to plasma etching, and outstanding lithographic properties and is useful in recording materials.

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