Negative-working radiation-sensitive mixture, and...

Details Negative-working radiation-sensitive mixture, and... Negative-working radiation-sensitive mixture, and...

G - Physics

03

C

G03C 1/73 (2006.01) C07C 303/28 (2006.01) G03F 7/038 (2006.01) G03F 7/16 (2006.01) C07C 309/65 (2006.01) C07C 309/66 (2006.01) C07C 309/73 (2006.01)

Patent

CA 2066147

Abstract of the Disclosure A negative-working radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least two groups crosslinkable by means of acid and c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) comprises a di-, tri- or tetra- hydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R-SO3H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.

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