C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 417/14 (2006.01) A61K 31/41 (2006.01) A61K 31/4427 (2006.01) C07D 401/14 (2006.01) C07D 403/14 (2006.01) C07D 413/14 (2006.01)
Patent
CA 2654898
The invention relates to compounds of general formula (I), wherein the radicals R2 to R4, L, Q and n are defined as indicated in claim 1. Said compounds are suitable for treating diseases that are characterised by excessive or anomal cell proliferation. The invention also relates to their use for producing a medicament having the above-mentioned properties.
La présente invention concerne des composés de formule générale (1) dans laquelle les radicaux R<SUP>2 à</SUP> R<SUP>4</SUP>, L, Q et n sont tels que définis dans la revendication 1. Ces composés conviennent pour le traitement de maladies qui se caractérisent par une prolifération cellulaire excessive ou anormale. L'invention a également pour objet l'utilisation de ces composés pour préparer un produit pharmaceutique ayant les propriétés sus-mentionnées.
Ettmayer Peter
Mantoulidis Andreas
Sapountzis Ioannis
Steegmaier Martin
Steurer Steffen
Boehringer Ingelheim International Gmbh
Fetherstonhaugh & Co.
LandOfFree
New chemical compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with New chemical compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and New chemical compounds will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1932714