C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 323/47 (2006.01) C07C 251/64 (2006.01) C07C 251/66 (2006.01) C07C 251/68 (2006.01) C07D 295/112 (2006.01) C08F 2/50 (2006.01) C08F 2/54 (2006.01) C08J 3/20 (2006.01) C08L 101/00 (2006.01) G02F 1/23 (2006.01) G03F 7/004 (2006.01) G03F 7/031 (2006.01) G03F 7/00 (2006.01) G03F 7/038 (2006.01)
Patent
CA 2276588
Oximeester compounds of the formulae I, II, III and IV (see formulae I, II, III and IV) R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by -O- , C2- C20alkanoyl or ben-zoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1' is C2- C12alkoxycarbonyl, or R1' is phenoxycarbonyl, or R1' is -CONR10R11 or CN; R2 is C2-C12alkanoyl, C4- C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1--C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2- C12alkanoyl, C2-C12alkoxy--carbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4', R5' and R6' are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12--alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R'4, R'5 and R'6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
Birbaum Jean-Luc
Dietliker Kurt
Kura Hisatoshi
Matsumoto Akira
Ohwa Masaki
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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