C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/469, 260/306
C07C 245/18 (2006.01) C07D 209/48 (2006.01) C07D 295/15 (2006.01) G03F 7/016 (2006.01)
Patent
CA 2007547
Abstract of the Disclosure Polyfunctional .alpha.-diazo-.beta.-keto esters of the general formula I are described Image (I) in which R1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH2 groups can be replaced by oxygen or sulfur atoms or by N- or NH groups and/or contain keto groups, X denotes an aliphatic, cycloaliphatic, carbo- cyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which indivi- dual CH2 groups can be replaced by oxygen or sulfur atoms or by the groups -NR2-, -C(O)- O-, -C(O)-NR2-, -C(O)-N-, -NR2-C(O)-NR3-, -O- C(O)-NR2-, -O-C(O)-N- or -O-C(O)-O-, or CH groups can be replaced by -N-, in which R2 and R3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical, m denotes an integer from 2 to 10 and n denotes an integer from 0 to 2, wherein m-n is ? 2. The compounds mentioned are used as photoactive com- ponents in radiation-sensitive mixtures.
Merrem Hans-Joachim
Pawlowski Georg
Wilharm Peter
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Merrem Hans-Joachim
Pawlowski Georg
Wilharm Peter
LandOfFree
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