C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
400/5011, 400/90
C08K 5/00 (2006.01) C07F 9/02 (2006.01) C07F 15/04 (2006.01)
Patent
CA 1039298
Abstract of the Disclosure Compounds of the formula (I) Image wherein either R1 represents a hydroxy group and R2 represents hydrogen or R1 represents hydrogen and R2 represents a hydroxy group, each of R3 and R4 independently represents hydrogen or alkyl, R5 represents alkyl, cycloalkyl, aralkyl, aryl, aralkyl or aryl groups which are monosubs- tituted, disubstituted or trisubstituted by hydroxy, alkyl, chlorine and/or alkoxy groups, or represents alkoxy, cyclo- alkoxy, aralkoxy, aryloxy or aralkoxy or aryloxy which is monosubstituted or disubstituted in the aryl moiety by alkyl, chlorine and/or alkoxy, R6 represents hydrogen, alkyl, cyclo- alkyl, aralkyl, aryl, aralkyl or aryl groups which are mono- substituted, disubstituted or trisubstituted by hydroxy, alkyl, chlorine and/or alkoxy groups, or represents alkoxy, cycloalkoxy, aralkoxy, aryloxy or aralkoxy or aryloxy which is monosubstituted or disubstituted in the aryl moiety by alkyl, chlorine and/or alkoxy groups,L is the monovelent anion of a carboxylic acid, M+ is an alkali metal ion, n and m are 1 to 2, p is 0, or 1 to 2, and q is 0 to 2 are suitable for stabilising polymer substrates.
214527
Moser Paul
Rody Jean
LandOfFree
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