G - Physics – 03 – F
Patent
G - Physics
03
F
96/155, 96/215
G03F 7/027 (2006.01)
Patent
CA 1052612
ABSTRACT OF THE DISCLOSURE Described are photopolymerizable compositions containing (a) an ethylenically unsaturated compound, (b) about 3-95% by weight of an organic polymeric binder, (c) about 0.1-5% by weight of a nitroso dimer which is a noninhibitor of free-radical polymerization but ther- mally dissociates to nitroso monomer which is an inhibitor of free-radical polymeri?ation, and (d) about 0.1-2% by weight of an organic, radiation-sen- sitive, free-radical generating system. Positive-working, contour images are formed by applying a layer of this composition to a substrate, imagewise exposing the photopolymerizable layer to actinic radiation through an image-bearing transparency at about 20-65°C, whereby free- radicals are consumed by nitroso monomer, deactivating the nitroso dimer inhibitor system, reexposing at least the unex- posed portion of the photopolymerizable layer to actinic radiation while continuing to maintain the nitroso dimer inhibitor system in the deactivated state, and developing the resulting image. The nitroso dimer inhibitor system may be deactivated by cooling the photopolymerizable layer to below about 10°C, and reexposing the layer to radiation that does not appreciably dissociate the nitroso dimer at a temperature below about 10°C, or by heating the photopolymerizable layer at about 80-150°C thereby destroying the nitroso dimer inhibitor system, and reexposing the layer to actinic radiation at about 20-60°C.
222275
E.i. Du Pont de Nemours And Company
Na
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