C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/228
C07H 5/04 (2006.01) C07H 13/12 (2006.01)
Patent
CA 1121347
NOVEL NITROSOUREA COMPOUNDS AND PROCESS FOR PREPARING THE SAME Abstract of the Disclosure The invention relates to nitrosourea compounds of the formula: Image wherein R1 is lower alkoxy, lower alkoxy-methoxy or 2-hydroxy-ethoxy, R2 is aldo-pentofuranosyl, aldo- pentopyranosyl, aldo-hexopyranosyl or O-aldo-hexopyranosyl- (1?4)-aldo-hexopyranosyl, and A is straight or branched alkylene of one to four carbon atoms (the alkylene being optionally substituted with lower alkoxy). These com- pounds may be prepared by nitrosation of a compound of the formula: Image wherein R1, R2 and A are the same as defined above. The nitrosourea compounds are useful as anti-tumor or anti-leukemic agents.
334307
Arai Yoshihisa
Ozeki Masakatsu
Tsujihara Kenji
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd.
LandOfFree
Nitrosourea compounds and process for preparing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Nitrosourea compounds and process for preparing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitrosourea compounds and process for preparing the same will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1163205