C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/228, 260/470
C07H 15/22 (2006.01) C07H 15/12 (2006.01) C07H 15/23 (2006.01)
Patent
CA 1049004
ABSTRACT OF THE DISCLOSURE Mitrosourea derivatives of the formula: Image wherein A represents a glycosyl group, a monovalent residue of methyl glucoside form which the 2-hydroxy group has been re- moved, a monovalent residue of alditol from which the 2-hydroxy group has been removed, N-substituted carbamoyloxyalkyl group or a hydroxy-substituted cyclohexyl group when n is 1, or A represents a tetravalent residue of ribostamycin form which the four amino groups have been removed when n is 4 and R represents a lower alkyl group or a halo-substituted lower alkyl group, provided that R is not methyl group when A is glucosyl group, are prepared by treating a compound of the formula: Image with a nitrosating agent. The novel nitrosourea derivatives have low toxicity and are useful as anti-leukemic and anti-tumor agents.
232963
Hisamatsu Takashi
Machinami Tomoya
Suami Tetsuo
Na
Suami Tetsuo
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