Non-corrosion photoresist stripping composition

Details Non-corrosion photoresist stripping composition Non-corrosion photoresist stripping composition

G - Physics

03

F

G03F 7/32 (2006.01) G03F 7/42 (2006.01)

Patent

CA 2146304

-21- ABSTRACT OF THE DISCLOSURE A non-corrosive photoresist composition containing: (a) 85-10% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 10-40% by weight of selected amine compounds; (c) 5-30% by weight of selected amino acid having a hydroxyl group; and, optionally, (d) 0-20% by weight water.

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