Non-corrosive cleaning composition for removing plasma...

Details Non-corrosive cleaning composition for removing plasma... Non-corrosive cleaning composition for removing plasma...

C - Chemistry, Metallurgy

11

D

C11D 7/32 (2006.01) C23G 1/22 (2006.01) G03F 7/42 (2006.01) H01L 21/3065 (2006.01) H01L 21/77 (2006.01)

Patent

CA 2214639

A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.

Composition de nettoyage non corrosive pour enlever les résidus de décapage à l'aide de plasmas comprenant de l'eau, au moins un hydroxyde d'ammonium quaternaire et au moins un inhibiteur de corrosion choisi parmi (i) les silicates d'ammonium quaternaire et (ii) les oligomères contenant un noyau catéchol de poids moléculaire se situant dans une étendue d'environ 220 à environ 5 000.

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