Non-precipitating photoresist composition

Details Non-precipitating photoresist composition Non-precipitating photoresist composition

G - Physics

03

F

96/165

G03F 7/023 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1296560

NON-PRECIPITATING PHOTORESIST COMPOSITION Abstract There is disclosed a photoresist composition comprising a light-sensitive, quinone diazide polymer, a binder and a benzene monomer trisubstituted with a diazo-naphthoquinone-sulfonyloxy group. The com- position is improved in that the diazo-naphthoquinone- sulfonyloxy group occupies the 1,2,4-positions on the benzene ring, whereby improved solubility is achieved.

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