Non-smutting acid etchant rinse for aluminum containing at...

C - Chemistry – Metallurgy – 23 – G

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

149/20

C23G 1/02 (2006.01) C11D 7/08 (2006.01) C23G 1/12 (2006.01)

Patent

CA 1333991

Abstract of the Disclosure Problems with previously known aqueous acidic rinsing solutions for aluminum after shaping while using surface lubricants are avoided by use of a solution comprising water and (A) orthophosphoric acid in an amount to give a stoichiometric equivalent of 3.0 to 50 g/L as PO4-3, (B) an aluminum ion sequestrant component in an amount of 0.01 to 10.0 g/L; and (C) 20 to 170 ppm of ferric ion. Preferably the solution also contains 0.1 to 1.0 g/L of H2O2, NO2-1 ions, or a mixture thereof to reoxidize ferrous ions formed by reduction of ferric ions during use of the solution and thus maintain the concentration of ferric ions above 20 ppm at all times. The solution may also contain surfactant and up to 10 g/L of dissolved aluminum ions.

610432

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Non-smutting acid etchant rinse for aluminum containing at... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non-smutting acid etchant rinse for aluminum containing at..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-smutting acid etchant rinse for aluminum containing at... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1293567

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.