C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 17/08 (2006.01) C07D 313/00 (2006.01) C07H 23/00 (2006.01)
Patent
CA 2228670
Compounds of formula (I), wherein OR1, OR2 and OR3 are hydroxyl radicals protected so as to form easily cleavable radicals, are useful for preparing antibiotic products.
L'invention a pour objet les composés de formule (I) dans lesquels OR1, OR2 et OR3 représentent des radicaux hydroxyles bloqués sous forme de radicaux facilement clivables. Les composés de formule (I) peuvent être utilisés pour préparer des produits antibiotiques.
Bonnet Alain
Delthil Michel
Mazurie Alain
Aventis Pharma S.a.
Hoechst Marion Roussel
Robic
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