C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 417/14 (2006.01) A61K 31/4545 (2006.01) A61K 31/506 (2006.01) A61P 35/00 (2006.01) A61P 41/00 (2006.01) C07D 401/14 (2006.01) C07D 413/14 (2006.01)
Patent
CA 2714215
The present invention relates to a compound of formula I:wherein: R1 is a hydrogen atom, F, CN, etc.; R2 is CO, SO2, etc.; R3 is a phenyl which may be substituted; X1, X2, and X3 each independently CH, N, etc. provided, however, that among X1, X2 and X3, the number of nitrogen is 0 or 1; W is the following residue:wherein: W1, W2, and W3 each independently CH, N, etc.,or a pharmaceutically acceptable salt or ester thereof.
La présente invention concerne un composé de formule I : dans laquelle : R1 représente un atome d'hydrogène, F, CN, etc. ; R2 représente CO, SO2, etc. ; R3 représente un phényle qui peut être substitué ; X1, X2 et X3 représentent chacun indépendamment CH, N, etc. ; à condition toutefois que le nombre d'azotes parmi X1, X2 et X3 soit 0 ou 1 ; W est le résidu suivant : dans lequel : W1, W2 et W3 représentent chacun indépendamment CH, N, etc., ou un de ses sels ou esters pharmaceutiquement acceptables.
Kato Tetsuya
Kawanishi Nobuhiko
Mita Takashi
Nonoshita Katsumasa
Ohkubo Mitsuru
Banyu Pharmaceutical Co. Ltd.
Msd K.k.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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