C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/12 (2006.01) A01N 43/24 (2006.01) A01N 43/40 (2006.01) A01N 43/54 (2006.01) A01P 3/00 (2006.01) A61K 31/335 (2006.01) A61K 31/44 (2006.01) A61K 31/505 (2006.01) C07D 321/00 (2006.01)
Patent
CA 2319807
Disclosed are novel compounds useful for prevention or control of diseases derived from fungi, a process for producing the same, and novel antifungal agents using the novel compounds. The compounds useful for prevention and treatment of diseases derived from fungi according to the present invention include novel compounds represented by formula (I). The compounds represented by formula (I) have potent antifungal activity against diseases derived from fungi, and do not have phytotoxicity to mammals and agricultural and garden plants, from which diseases should be eliminated, and, even when applied to agricultural and garden plants, have high photostability. (see formula I) wherein R1 represents isobutyryl, tigloyl, isovaleryl, or 2-methylbutanoyl; R2 represents a hydrogen atom, an aromatic carboxylic acid residue, or a protective group of amino; and R3 represents a hydrogen atom, nitro, amino, acylamino, or N,N-dialkylamino, excluding the case where, when R1 represents isobutyryl, tigloyl, isovaleryl, or 2- methylbutanoyl with R3 representing a hydrogen atom, R2 represents a 3-hydroxypicolinic acid residue, 3-hydroxy-4-methoxypicolinic acid residue, or a 3,4-dimethoxypicolinic acid residue.
L'invention concerne des composés représentés par la formule générale (I) présentant une activité antifongique puissante sans agression chimique pour l'homme, les animaux ou les plantes agricoles/horticoles auxquels sont appliqués les composés, lesquels présentent une photostabilité élevée, formule dans laquelle R?1¿ représente isobutyryle, tigloyle, isovaléryle ou 2-méthylbutanoyle; R?2¿ représente hydrogène, carboxylate aromatique ou un groupe amino-protecteur; et R?3¿ représente hydrogène, nitro, amino, acylamino ou N,N-dialkylamino (à condition que soit exclu le cas dans lequel R1 représente isobutyryle, tigloyle, isovaléryle ou 2-méthylbutanoyle et R3 représente hydrogène, et ensuite R2 représente 3-hydroxypicolinate, 3-hydroxy-4-méthoxypicolinate ou 3,4-diméthoxypicolinate).
Iinuma Katsuharu
Kuzuhara Kikuko
Mikoshiba Haruki
Mitomo Koichi
Murai Yasushi
Fetherstonhaugh & Co.
Meiji Seika Kaisha Ltd.
LandOfFree
Novel antifungal compound and process for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Novel antifungal compound and process for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novel antifungal compound and process for producing the same will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1498242