C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/266
C07D 487/04 (2006.01) A61K 31/435 (2006.01) A61K 31/495 (2006.01) A61K 31/695 (2006.01) C07D 477/20 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2036163
The present invention provides a compound of the formula: (see above formula) wherein R0 is a hydrogen atom or a protective group for hydroxyl, R1 is a lower alkyl group, R2 is a protective group for carboxyl or a negative charge, R3 is a hydrogen atom or a protective group for amino, R4 is a lower alkyl group or a substituted lower alkyl group, k is an integer of 0 to 4, X is an acid residue or an intramolecular COO when R2 is a negative charge and Q~ is a quaternary nitrogen atom-containing group represented by either one of the formulae (1) to (4): (see formula 1) wherein R5 is a hydrogen atom, a lower alkyl group or a 2-hydroxyethyl group, R6 is a hydrogen atom or a lower alkyl group and n is an integer of 0 to 4; (see formula 2) wherein R7 and R8 are each a lower alkyl group or may be combined together to form a lower alkylene group, or R8 represents a substituted lower alkyl group and n is as defined above; (see formula 3) wherein R9 is a lower alkyl group or a substituted lower alkyl group; or (see formula 4) wherein R5, R6, R9 and n are each as defined above, or its salt. The compound of the present invention is suitable for use as an antimicrobial agent.
Fukasawa Masatomo
Nouda Hiroshi
Sasaki Akira
Sunagawa Makoto
Yamaga Hiroshi
Kirby Eades Gale Baker
Sumitomo Pharmaceuticals Company Limited
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