C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 235/12 (2006.01) A61K 31/4184 (2006.01) A61K 31/4439 (2006.01) A61K 31/454 (2006.01) A61K 31/47 (2006.01) A61K 31/5377 (2006.01) C07D 215/14 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 405/12 (2006.01) C07D 413/12 (2006.01)
Patent
CA 2372079
Compounds, pharmaceutically acceptable salts, and compositions thereof of general formula (I): wherein Ar is aryl and heteroaryl; R1, R2, R3, and R4 are hydrido, alkyl, cyano, heteroaryl, hydroxy, amino, acylamino, halo, alkoxy, aryloxy, carboxyamido, alkenyl, cycloalkyl, heterocyclyl, acyl, acyloxy, carboalkoxy, carboxy, thio, sulfinyl, sulfonyl and sulfoxy, R5, R6, R7, and R8 are hydrido and lower alkyl; and Het is a nitrogen-containing heterocyclic ring.
L'invention concerne des composés, des sels pharmaceutiquement acceptables et des compositions desdits composés de la formule générale (I), dans laquelle Ar est aryle et hétéroaryle; R?1¿, R?2¿, R?3¿ et R?4¿ sont hydrido, alkyle, cyano, hétéroaryle, hydroxy, amino, acylamino, halo, alcoxy, aryloxy, carboxyamido, alcényle, cycloalkyle, hétérocyclyle, acyle, acyloxy, carboalcoxy, carboxy, thio, sulfinyle, sulfonyle et sulfoxy; R?5¿, R?6¿, R?7¿ et R?8¿ sont hydrido et alkyle inférieur; et Het est un noyau hétérocyclique azoté.
Finn John
Hammond Milton L.
Hill Jason
Keith Dennis
Leeman Aaron H.
Cubist Pharmaceuticals Inc.
Merck & Co. Inc.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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