C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/56 (2006.01) A61K 31/545 (2006.01) A61K 31/695 (2006.01) C07D 501/00 (2006.01) C07D 519/00 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2053456
Novel cephem compounds represented by a formula [I] and pharmacologically admissible salts or capable of physiologically hydrolyzable nontoxic esters thereof are disclosed. (see formula I) [wherein R1 indicates a straight-chain or branched lower alkyl group, which may be substituted by carboxyl group which may be protected, trityl group, hydrogen atom or fluorine-substituted lower alkyl group, R2 indicates a hydrogen atom, metal atom, protective group for carboxyl group or ester residue producible hydrolyzable ester in vivo, R3, R4, R5 and R6, which may be identical or different, indicate hydrogen atoms, halogen atoms, straight-chain or branched lower alkyl groups, which may be substituted, mercapto groups, which may be substituted, lower alkylamino groups, hydroxyl groups, which may be protected, lower alkoxy groups, lower alkanoyl groups, lower alkoxycarbonyl groups, or lower alkylenedioxy group, which may be substituted, being maybe formed with R3 and R4, R7 indicates a hydrogen atom, cyano group, halogen atom or COOR8 (R8 is hydrogen or lower alkyl group), R9 indicates an amino group, which may be protested, Z indicates N or CH, and n indicates 0 or 1). Preparation processes for them and antibacterial agents containing them as effective ingredients are also claimed.
Fukuda Hideyuki
Hirai Keiji
Obi Kikoh
Saito Tatsuhiro
Suzue Seigo
Borden Ladner Gervais Llp
Kyorin Pharmaceutical Co. Ltd.
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