C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 409/14 (2006.01) C07D 417/14 (2006.01)
Patent
CA 2394139
The invention relates to a compound of formula (I), wherein Het¿1? and Het¿2? are the same or different and each represent a heteroaryl radical and A represents a bond or an alkylene radical which may optionally be substituted, to isomers thereof and to addition salts of said compound with a pharmaceutically acceptable acid. The invention also relates to corresponding medicaments.
Composé de formule (I) dans laquelle: Het1 et Het2, identiques ou différents représentent chacun un groupement hétéroaryle; A représente une liaison ou un groupement alkylène éventuellement substitué, ses isomères ainsi que ses sels d'addition à un acide pharmaceutiquement acceptable.
Bizot-Espiard Jean-Guy
Caignard Daniel-Henri
Duflos Muriel
Le Baut Guillaume
Nourrisson Marie-Renee
Les Laboratoires Servier
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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