C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) C07D 487/04 (2006.01) C07D 519/00 (2006.01)
Patent
CA 2140453
The present invention relates to novel diazabicycloalkenes of Formula (I), wherein R1 and R5 each represent hydrogen, lower alkyl or a conventional amino-protecting group; R2, R3 and R4 each represent hydrogen, lower alkyl, lower alkyl sub- stituted by amino, hydroxyl or halogen; and n denotes an integer of 0 or 1. The present invention also provides novel quino- lone carboxylic acid derivatives of Formula (I-A), wherein R1, R3 and R4 are the same as defined above; A is hydrogen or chlorine atom, or methyl or an amino group; B is a lower alkyl group, or a cyclopropyl or a phenyl group optionally substi- tuted with a halogen atom; and C is nitrogen atom, or a methyne group optionally substituted with a lower alkyl or a lower alkoxy group or a halogen atom, and their pharmaceutically acceptable salts. The present invention also relates to processes for preparing these compounds.
Kim Moon K.
Kim Wan J.
Park Tae H.
Bereskin & Parr
Korea Research Institute Of Chemical Technology
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