C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 17/08 (2006.01) A61K 31/70 (2006.01) C07D 401/04 (2006.01) C07D 417/04 (2006.01) C07D 471/04 (2006.01) C07D 473/00 (2006.01) C07D 495/04 (2006.01) C07H 17/00 (2006.01)
Patent
CA 2189271
Compounds of formula (I) in which R is a -(CH¿2?)¿n?Ar radical, n is 3, 4 or 5, Ar is an optionally substituted heterocyclic radical and Z is a hydrogen atom or an acid residue. The compounds of formula (I) have useful antibiotic properties.
L'invention a pour objet les composés de formule (I) dans lesquels: R représente un radical -(CH2)nAr, n représentant le nombre 3, 4 ou 5, Ar représentant un radical hétérocyclique, éventuellement substitué, Z représentant un atome d'hydrogène ou le reste d'un acide. Les composés de formule (I) présentent d'intéressantes propriétés antibiotiques.
Agouridas Constantin
Chantot Jean-Francois
Denis Alexis
Gouin D'ambrieres Solange
Le Martret Odile
Aventis Pharma S.a.
Robic
Roussel-Uclaf
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