Novel material forming supramolecular structures, process...

C - Chemistry – Metallurgy – 08 – L

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C08L 101/06 (2006.01) C08K 5/205 (2006.01) C08K 5/21 (2006.01) C09D 201/06 (2006.01) C09J 201/06 (2006.01)

Patent

CA 2569291

The invention relates to novel material, forming supramolecular structures below its transition temperature, which contains at least one C=O and/ or C=S group and at least one N-H, O-H and/ or S-H group and wherein the material has the structure A(-X-B) n (1) wherein A is a cyclic, aromatic and/ or aliphatic group, n being a number of 1 to 4,-X-B is, if n is 2, the same or different, and if n is 3 or 4, the same, partly the same or different and has one of the structures (2) to (4) -NH-C(Y)-Y-B (2) -NH -C(Y)-NR-B (3) -Y-C(Y)-NH-B (4) with Y being an Oxygen and/ or Sulfur atom, B being an organic group with at least one heteroatom, where the heteroatom is bound to at least two carbon atoms when B is linear or cyclic, and where the heteroatom is bound to at least one carbon atom when B is branched, and R being a Hydrogen atom, a cyclic, aromatic and/ or aliphatic group or another B group which is the same or different. The material can be made by reacting at least one isocyanate and/ or thioisocyanate with at least one amine, alcohol and/ or thiol. Typically, the material is used first below its transition temperature, followed by increasing the temperature to around or above the transition temperature, carrying out a process step and subsequently decrease the temperature below the transition temperature.

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