C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
C23F 11/167 (2006.01) C02F 5/14 (2006.01) C07F 9/38 (2006.01) C07F 9/48 (2006.01) C08F 8/40 (2006.01) C09D 5/08 (2006.01) C11D 3/00 (2006.01) C11D 3/37 (2006.01) C23F 11/173 (2006.01)
Patent
CA 2230517
The reaction of compounds of the formula: X2O3P CHY CZ2 where Y and each Z are each H, PO3X2, SO3X or CO2X (e.g. vinyl phosphonic acid or vinylidene diphosphonic acid) with hypophosphorous acid in the presence-of free radicals provides novel compounds X2O3PCHYCZ2PO2XH which react with monomers such as vinyl sulphonate, vinyl phosphonate, vinylidene diphosphonate and acrylic acid to form telomers useful for scale inhibition, especially barium scale in oil wells. The polymers show better absorption to rock than PVSA and better thermal stability than random copolymers containing equivalent phosphorus.
Davis Keith Philip
Smith Alan Craig
Walker David Robert Edward
Woodward Gary
Albright & Wilson Uk Limited
Sim & Mcburney
LandOfFree
Novel phosphino derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Novel phosphino derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novel phosphino derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1576656