C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 295/205 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) C07D 213/74 (2006.01) C07D 241/04 (2006.01) C07D 295/215 (2006.01) C07D 401/00 (2006.01) C07D 413/06 (2006.01)
Patent
CA 2141210
The present invention concerns novel compounds of general formula (I) wherein R1 and R2 are the same or different and selected from hydrogen or lower alkyl; wherein Ar are the same or different and selected from (II) and (III) wherein R3 is halogen or hydrogen. n is 2 or 3, X is nitrogen or methine. When X is nitrogen Y is methylene. When X is methine Y is se- lected from nitrogen or oxygen. A is selected from the carboxylic derivatives (IV) and (V) wherein R4 and R5 are the same or different and selected from hydrogen, alkyl, cycloalkyl or aryl. Z is selected from sulfur or oxygen. R6 is selected from (VI) and (VII) wherein m is 1, 2, 3 or 4. R7 is selected from hydrogen or lower alkyl, and the pharmacologically active salts there- of. The new compounds are useful for treating mental disorders.
Abramo Lisbeth
Brodszki Martin
Lundstedt Torbjorn
Nordvi Curt
Olsson Knut G.
Ab Pharmacia
Biovitrum Ab
Gowling Lafleur Henderson Llp
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