C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 307/54 (2006.01) A61K 31/00 (2006.01) A61K 31/341 (2006.01) A61K 31/357 (2006.01) A61K 31/381 (2006.01) A61K 31/40 (2006.01) C07D 407/14 (2006.01)
Patent
CA 2377902
A methods of treating an infection comprises administering a therapeutically effective amount of a compound described by Formula (I), wherein: X may be O, S, or NR' wherein R' is H or loweralkyl; R1 and R2 may be independently selected from the group consisting of H, loweralkyl, oxyalkyl, alkoxyalkyl, cycloalkyl, aryl, hydroxyalkyl, aminoalkyl, and alkylaminoalkyl; R3 and R4 are each independently selected from the group consisting of H, loweralkyl, halogen, oxyalkyl, oxyaryl, and oxyarylalkyl; R5 is represented by a formula selected from the group consisting of: (a) and (b), wherein: X1, X2, and X3 are independently selected from O and S; and R6 and R7 are independently selected from the group consisting of loweralkyl, aryl, alkylaryl, oxyaryl, an ester-containing substituent, and oxyalkyl; or a pharmaceutically acceptable salt thereof.
L'invention concerne des méthodes de traitement d'une infection, qui consistent à administrer une dose efficace au plan thérapeutique d'un composé de formule (I) ou d'un sel de celui-ci, acceptable au plan pharmaceutique,. Dans ladite formule (I), X peut représenter O, S, ou NR', R' représentant H ou alkyle inférieur ; R¿1? et R¿2? peuvent être choisis séparément dans le groupe constitué de H, alkyle inférieur, oxyalkyle, alcoxyalkyle, cycloalkyle, aryle, hydroxyalkyle, aminoalkyle et alkylaminoalkyle; R¿3? et R¿4? sont choisis séparément dans le groupe constitué de H, alkyle inférieur, halogène, oxyalkyle, oxyaryle et oxyarylalkyle ; R¿5? est représenté par une formule choisie dans le groupe constitué de (a) et (b), X¿1?, X¿2?, X¿3? étant choisis séparément parmi O et S ; et R¿6? et R¿7? étant choisis séparément dans le groupe constitué d'alkyle inférieur, aryle, alkylaryle, oxyaryle, un substituant contenant un ester, et oxyalkyle.
Boykin David W.
Hall James E.
Rahmathullah M. Syed
Tidwell Richard R.
Georgia State University
Robic
The University Of North Carolina At Chapel Hill
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