C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/226, 260/277
C07D 401/04 (2006.01) A61K 31/47 (2006.01)
Patent
CA 1340285
Novel compounds of the present invention are represented by the general formula (1) Image wherein R1 is hydrogen atom or amino, R2 is fluorine atom or methoxy, R3 is hydrogen atom or a lower alkyl having 1 to 3 carbon atoms, and n is 0 or 1. The compounds of the general formula (1) exhibit higher antibacterial activity with fewer side-effects than known quinolone antibiotics such as ofloxacin and norfloxacin. Further, the compounds having the general formula (1) have reduced phototoxicity which normally accompanies 6,8-difluoroquinoline antibiotics.
600074
Katoh Yasuyuki
Nagano Hiroyuki
Yokota Takeshi
Chugai Seiyaku Kabushiki Kaisha
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
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