C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/09 (2006.01) C07F 9/11 (2006.01) C11D 1/34 (2006.01) C11D 1/78 (2006.01) C11D 3/30 (2006.01)
Patent
CA 2078442
-1- Disclosed are novel low skin irritation surfactants and surfactant compositions which are high in foaming properties containing, as an active ingredient, a diamine monoalkyl phosphate salt. It has the formula: Image wherein R is a hydrophobic group or the condensation product of a hydrophobic group with ethylene oxide, preferably R is alkyl or alkenyl having an average of from about 10 to 18 carbon atoms, and wherein X1 and X2 are independently selected from the group consisting of hydrogen, alkali metal, ammonium, substituted ammonium (e.g., alkoxylated ammonium, alkylammonium, alkoxylated aliphatic amines, polyethoxylated amines) and alkylene diamine, provided that at least one of X1 and X2 is a totally hydroxyalkylated alkylene diamine.
Deckner George Endel
Ehrhard Joseph Albert Jr.
Kirby Eades Gale Baker
Richardson-Vicks Inc.
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